The authors would like to acknowledge the financial support from Universiti Kebangsaan Malaysia research grant: UKM-GGPM-2022-069 to carry out this research.

1. Substrate preparation
<ol>
	<li>Wipe the glass substrates with lint-free cloth to remove loose dirt or debris. Wash glass substrates with water and soap, use brush to scrub any dirt on the glass.</li>
	<li>Prepare all solvents listed below in beakers, submerge the glass substrates in the solvent and sonicate accordingly at 37 kHz. Prepare methanol at 80 &#176;C for 10 min; acetone at 80 &#176;C for 10 min, ethanol at 80 &#176;C for 10 min, distilled (DI) water at 80 &#176;C for 20 min. 
	CAUTION: Handle highly volatile chemicals in a fume hood.</li>
	<li>Take out the substrates from the beaker one by one using a tweezer, put on a clean flat surface, hold down the substrate with tweezer and blow with nitrogen gas until dry.</li>
	<li>Put substrates on a hot plate at 120 &#176;C for 5-10 min to vaporize any residue. Put substrates in UV-ozone cleaner for 10 min.</li>
</ol>
2. Sputtering method
<ol>
	<li>Chamber preparation
	<ol>
		<li>Take off the aluminum shield from the gun and put the target material at the center of the cover. Tightly screw the cover on the magnetron holder and put back the aluminum shield. Cover the body of the chamber, guns, and sample holder with aluminum foil.</li>
		<li>Run short-circuit inspection by touching the probes of a multimeter between the chamber bodies (short), followed by the chamber body and the gun (short), and finally the chamber body and the target (open). This test is necessary to ensure there is no current leakage between the body (anode) and the target (cathode), which can hinder the formation of plasma.</li>
	</ol>
	</li>
	<li>Pre-sputtering
	<ol>
		<li>Close the door and vacuum the chamber for 15 - 30 min. Press the door and the body together at the beginning of the vacuuming to ensure the door is tightly closed. Make sure the reading of the pressure gauge is decreasing.</li>
		<li>Switch ON the cooler system and set to 15 &#176;C. Turn ON the pump and refrigeration button, and open the valve connected to the sputtering instrument. 
		NOTE: RF sputtering does not function without a cooling system. The formation of plasma will not happen.</li>
		<li>Set Argon flow to 4 sccm and switch ON the gas toggle switch. Wait until the flow reaches the set value.</li>
		<li>Set rotation to 10 rpm and switch ON the rotation toggle switch. Push the Power button to switch ON the automatic matching network controller and radio frequency power supply.</li>
		<li>On the automatic matching network controller, set load and tune to 50 W each by pushing the Min/Max button and push the button from Manual to Auto.</li>
		<li>On the radio frequency power supply, set RF power to 50 W and push the Start button. Set the timer to 15 min.</li>
		<li>Switch OFF the RF power and rotation. Set Argon flow to 0 and switch OFF the toggle switch. Switch OFF the vacuum. 
		NOTE: Wait until the Argon flow reaches 0.1 sccm before switching off the vacuum.</li>
		<li>Vent to open the chamber. Make sure the turbomolecular pump (TMP) is OFF before venting. Venting while TMP is running will damage the system.</li>
		<li>Open the chamber and load substrates. Place the substrates at the outer corner of the rotating sample holder for better deposition as shown in Figure 1. 
		CAUTION: Wear mask and glove when handling the inside of the chamber to avoid inhaling small particles of materials.</li>
		<li>Close the door as shown in Figure 2 and vacuum for at least 6 h. Lower base pressure gives better deposition. The optimum base pressure for a high vacuum system such as sputtering process is 1 x 10-5 Torr.</li>
	</ol>
	</li>
	<li>Sputtering
	<ol>
		<li>Switch ON the cooler system and set to 15 &#176;C. Turn ON the pump and refrigeration button, and open the valve connected to the sputtering instrument.</li>
		<li>Set rotation to 10 rpm and switch ON the rotation toggle switch. Set Argon flow to 4 sccm and switch ON the gas toggle switch. Wait until the flow reaches the set value.</li>
		<li>Push the Power button to switch ON the automatic matching network controller and radio frequency power supply.</li>
		<li>On the automatic matching network controller, set load and tune to 50 W each by pushing the Min/Max button and push the button from Manual to Auto.</li>
		<li>On the radio frequency power supply, set RF power to 50 W and push the Start button. 
		NOTE: Wait until the Argon flow reaches the set value and becomes stable before turning on the RF power.</li>
		<li>Check for presence of plasma in the chamber. The formation of plasma is indicated by a glowing purple light in the chamber. If the plasma is not present once the RF power is turned ON, switch OFF Argon for 10 s, and turn it back ON. Repeat until plasma forms in the chamber.</li>
		<li>Gradually increase the RF power with 5 W per 10 s interval until it reaches 75 W. Set the timer to 60 min.</li>
	</ol>
	</li>
	<li>Post-sputtering
	<ol>
		<li>Switch OFF the RF power and rotation. Turn OFF the automatic matching network controller and radio frequency power supply.</li>
		<li>Set Argon flow to 0 and switch OFF the gas toggle switch. Switch OFF the vacuum. 
		NOTE: Wait until the Argon flow reaches 0.1 sccm before switching OFF the vacuum.</li>
		<li>Vent to open the chamber. Make sure the TMP is OFF before venting. Venting while TMP is running will damage the system.</li>
		<li>Take out all samples using tweezer and put in a clean Petri dish. 
		&#8203;CAUTION: Wear mask and glove when handling the inside of the chamber to avoid inhaling small particles of materials.</li>
		<li>Clean the chamber and vacuum for 10 - 15 min to keep the chamber under vacuum condition (free from impurities).</li>
	</ol>
	</li>
</ol>
<img alt="Figure 2" class="xfigimg" src="/files/ftp_upload/66248/66248fig02.jpg" /> 
Figure 2: Experimental setup. Photograph of the sputtering machine used in this study. <a href="https://www.jove.com/files/ftp_upload/66248/66248fig02large.jpg" target="_blank">Please click here to view a larger version of this figure.</a>
3. Characterization
<ol>
	<li>Perform topographic and cross-sectional scanning using Field Emission Scanning Electron Microscope (FESEM, under 3.0 kV operating voltage) to obtain the surface microstructural details and thickness of the sputtered films.</li>
	<li>Perform calculation on composition of the films using data of the energy dispersive X-ray spectra (EDX), attached with the FESEM. Measure Hall voltage in a permanent magnetic field of 0.57&#8239;T and probe currents of 0.8 mA and 10&#8239;mA for Sb2Te3 and Bi2Te3,, respectively to obtain the carrier concentration and conductivity of the films35.</li>
	<li>Perform in-plane measurement of Seebeck coefficient using a similar instrument used by Isotta et al.5. Mount samples with a rectangular geometry of approximately 2 cm x 1.25 cm on the setup. Measure the absolute Seebeck coefficient in 2-contact configuration against a Pt standard, with a temperature gradient of &#8776;25 &#176;C.</li>
</ol>

Deposition of Bi&lt;sub&gt;2&lt;/sub&gt;Te&lt;sub&gt;3&lt;/sub&gt; and Sb&lt;sub&gt;2&lt;/sub&gt;Te&lt;sub&gt;3&lt;/sub&gt; Thin Films on Glass Substrates via RF Sputtering

The authors have nothing to disclose.

The technique presented in this paper presents no significant difficulty in setting up the equipment and implementation. However, several critical steps need to be highlighted. As mentioned in step 2.2.10 of the protocol, optimum vacuum condition is key to produce high quality thin films with less contamination as vacuum removes residual oxygen in the chamber37. The presence of oxygen can cause cracks in the films called stress cracking indicating the importance of high vacuum system in sputtering...

Thermoelectric (TE) materials have been attracting a considerable amount of research interest regarding their ability to convert thermal energy into electricity via the Seebeck effect1 and refrigeration via Peltier cooling2. The conversion efficiency of TE material is determined by the temperature difference between the hot end of the TE leg and the cold end. Generally, the higher the temperature difference, the higher the TE figure of merit and the higher its efficiency3. TE works with no requirement for additional mechanical parts involving gas or liquid in its process, producing no waste or pollution, making it environmentally safe and considered a green energy harvesting system.
Bismuth telluride, Bi2Te3, and its alloys remain the most important class of TE material. Even in thermoelectric power generation, such as the recovery of waste heat, Bi2Te3 alloys are most commonly used due to their superior efficiency up to 200 &#176;C4 and remain an excellent TE material at ambient temperature despite the zT value of more than 2 in various TE materials5. Several published papers have studied the TE properties of this material, which shows that the stoichiometric Bi2Te3 has a negative Seebeck coefficient6,7,8, indicating n-type properties. However, this compound can be adjusted to p- and n-type by alloying with antimony telluride (Sb2Te3) and bismuth selenide (Bi2Se3), respectively, which can increase their bandgap and reduce bipolar effects9.
Antimony telluride, Sb2Te3 is another well-established TE material with high figure of merit at low temperature. While stoichiometric Bi2Te3 is a great TE with n-type properties, Sb2Te3 has p-type properties. In some cases, the properties of TE materials often depend on the atomic composition of the material such as the n-type Te-rich Bi2Te3, but a p-type Bi-rich Bi2Te3 due to BiTe antisite acceptor defects4. However, Sb2Te3 is always p-type due to comparatively low formation energy of SbTe antisite defects, even in Te-rich Sb2Te34. Thus, these two materials become suitable candidates to fabricate p-n module of thermoelectric generator for various applications.
The current conventional TEGs are made of diced ingots of n-type and p-type semiconductors connected vertically in series10. They have only been used in niche fields due to their low efficiency and bulky, rigid nature. Over time, researchers have started to explore thin film structures for better performance and application. It is reported that thin film TE have advantages over their bulky counterpart such as higher zT due to their low thermal conductivity11,12, less amount of material and easier integration with integrated circuit12. As a result, niche TE research on thin film thermoelectric devices has been on the rise benefitting from the advantages of nanomaterial structure13,14.
Microfabrication of thin film is important to attain high performance TE materials. Various deposition approaches have been researched and developed including chemical vapor deposition15, atomic layer deposition16,17, pulsed laser deposition18,19,20, screen printing8,21, and molecular beam epitaxy22 to serve this purpose. However, the majority of these techniques suffer from high operation cost, complex growth process or complicated material preparation. On the contrary, magnetron sputtering is a cost-effective approach for producing high-quality thin films that are denser, exhibit smaller grain size, have better adhesion, and high uniformity23,24,25.
Magnetron sputtering is one of the plasma-based physical vapor deposition (PVD) processes which is widely used in various industrial applications. Sputtering process works when sufficient voltage is applied to a target (cathode), ions from the glow discharge plasma bombards the target and release not only secondary electrons, but also atoms of the cathode materials which eventually impact the surface of the substrate and condense as a thin film. Sputtering process was first commercialized in 1930s and improved in 1960s, gaining significant interest due to its ability to deposit wide range of materials using direct current (DC) and RF sputtering26,27. The magnetron sputtering overcomes low deposition rate and high substrate heating impact by utilizing magnetic field. The strong magnet confines the electrons in the plasma at or near the surface of the target and prevent damage to the formed thin film. This configuration preserves the stoichiometry and thickness uniformity of the deposited thin film28.
The preparation of Bi2Te3 and Sb2Te3 thermoelectric thin films using magnetron sputtering method has also been extensively studied, incorporating technique such as doping4,29,30 and annealing31 in the procedures, leading to different performance and quality. Study by Zheng et al.32 uses thermally induced diffusion method to diffuse Ag-doped Bi and Te layer which were sputtered separately. This method enables precise control on the composition of the thin films and the diffusion of Te by thermal induction protects the Te from being volatilized. The properties of the thin films can also be enhanced by pre-coating process33 before sputtering which results in better electrical conductivity due to high carrier mobility, consequently enhancing the power factor. Other than that, study by Chen et al.34 improved the thermoelectric performance of sputtered Bi2Te3 by doping Se via post-selenization diffusion reaction method. During the process, Se vaporizes and diffuses into the Bi-Te thin films to form Bi-Te-Se films, which results in 8-fold higher power factor than undoped Bi2Te3.
This paper describes our experimental setup and procedure for the RF magnetron sputtering technique to deposit Bi2Te3 and Sb2Te3 thin films on glass substrates. Sputtering was performed in a top-down configuration as shown in the schematic diagram in Figure 1, cathode was mounted at an angle to the substrate normal, leading to a more concentrated and convergent plasma to the substrate. The films were systematically characterized using FESEM, EDX, Hall effect and Seebeck coefficient measurement to study their surface morphology, thickness, composition, and thermoelectric properties.
<img alt="Figure 1" class="xfigimg" src="/files/ftp_upload/66248/66248fig01.jpg" /> 
Figure 1: A schematic of the top-down configuration sputter. The diagram was designed according, but not to scale, to the actual sputtering configuration available for this study including the arrangement of glass substrates to be sputtered viewed from the top. <a href="https://www.jove.com/files/ftp_upload/66248/66248fig01large.jpg" target="_blank">Please click here to view a larger version of this figure.</a>

<table border="1" fo:keep-together.within-page="1" fo:keep-with-next.within-page="always">
	<tbody>
		<tr>
			<td>Acetone</td>
			<td>Chemiz (M) Sdn. Bhd.</td>
			<td>1910151</td>
			<td>Liquid, Flammable</td>
		</tr>
		<tr>
			<td>Antimony Telluride, Sb2Te3</td>
			<td>China Rare Metal Material Co.,Ltd</td>
			<td>C120222-0304</td>
			<td>Diameter 50.8 mm, Thickness 6.35 mm, 99.999% purity</td>
		</tr>
		<tr>
			<td>Bismuth Telluride, Bi2Te3</td>
			<td>China Rare Metal Material Co.,Ltd</td>
			<td>CB151208-0501</td>
			<td>Diameter 50.8 mm, Thickness 4.25 mm, 99.999% purity</td>
		</tr>
		<tr>
			<td>Ethanol</td>
			<td>Chemiz (M) Sdn. Bhd.</td>
			<td>2007081</td>
			<td>Liquid, Flammable</td>
		</tr>
		<tr>
			<td>Field Emission Scanning Electron Microscope</td>
			<td>Zeiss</td>
			<td>MERLIN</td>
			<td>Equipped with EDX</td>
		</tr>
		<tr>
			<td>Hall effect measurement system</td>
			<td>Aseptec Sdn. Bhd.</td>
			<td>HMS ECOPIA 3000</td>
			<td>-</td>
		</tr>
		<tr>
			<td>Handheld digital multimeter</td>
			<td>Prokits Industries Sdn. Bhd.</td>
			<td>303-150NCS</td>
			<td>-</td>
		</tr>
		<tr>
			<td>HMS-3000</td>
			<td>Aseptec Sdn Bhd.</td>
			<td>HMS ECOPIA 3000</td>
			<td>Hall effect measurement software</td>
		</tr>
		<tr>
			<td>Linseis_TA</td>
			<td>Linseis Messger&#228;te GmbH</td>
			<td>LSR-3</td>
			<td>Linseis thermal analysis software</td>
		</tr>
		<tr>
			<td>Methanol</td>
			<td>Chemiz (M) Sdn. Bhd.</td>
			<td>2104071</td>
			<td>Liquid, Flammable</td>
		</tr>
		<tr>
			<td>RF-DC magnetron sputtering</td>
			<td>Kurt J. Lesker Company</td>
			<td>-</td>
			<td>Customized hybrid system</td>
		</tr>
		<tr>
			<td>Seebeck coefficient measurement system</td>
			<td>Linseis Messger&#228;te GmbH</td>
			<td>LSR-3</td>
			<td>-</td>
		</tr>
		<tr>
			<td>SmartTiff</td>
			<td>Carl Zeiss Microscopy Ltd</td>
			<td>-</td>
			<td>SEM image thickness measurement software</td>
		</tr>
		<tr>
			<td>Ultrasonic bath</td>
			<td>Fisherbrand</td>
			<td>FB15055</td>
			<td>-</td>
		</tr>
		<tr>
			<td>UV ozone cleaner</td>
			<td>Ossila Ltd</td>
			<td>L2002A3-UK</td>
			<td>-</td>
		</tr>
	</tbody>
</table>

fabrication of bi2te3 and sb2te3 thermoelectric thin films using radio frequency magnetron sputtering technique

Through various studies on thermoelectric (TE) materials, thin film configuration gives superior advantages over conventional bulk TEs, including adaptability to curved and flexible substrates. Several different thin film deposition methods have been explored, yet magnetron sputtering is still favorable due to its high deposition efficiency and scalability. Therefore, this study aims to fabricate a bismuth telluride (Bi2Te3) and antimony telluride (Sb2Te3) thin film via the radio frequency (RF) magnetron sputtering method. The thin films were deposited on soda lime glass substrates at ambient temperature. The substrates were first washed using water and soap, ultrasonically cleaned with methanol, acetone, ethanol, and deionized water for 10 min, dried with nitrogen gas and hot plate, and finally treated under UV ozone for 10 min to remove residues before the coating process. A sputter target of Bi2Te3 and Sb2Te3 with Argon gas was used, and pre-sputtering was done to clean the target&#39;s surface. Then, a few clean substrates were loaded into the sputtering chamber, and the chamber was vacuumed until the pressure reached 2 x 10-5 Torr. The thin films were deposited for 60 min with Argon flow of 4 sccm and RF power at 75 W and 30 W for Bi2Te3 and Sb2Te3, respectively. This method resulted in highly uniform n-type Bi2Te3 and p-type Sb2Te3 thin films.

Author Spotlight: Advancements in High-Performance Thermoelectric Thin Films Through Radio Frequency Magnetron Sputtering

Fabrication of Bi2Te3 and Sb2Te3 Thermoelectric Thin Films using Radio Frequency Magnetron Sputtering Technique

Our research focuses on fabricating high-quality thin films for thermoelectric generators to recover waste heat and turn it into electricity. Various thin film deposition technique have been researched and developed, including radio frequency magnetron sputtering that is able to produce high-density, robust thin films with better adhesion and high uniformity. This method does not require melting and evaporation of the target materials, enabling most of materials to be deposited regardless of their melting temperature, making it superior than other physical vapor deposition technologies.

Cross-sectional micrographs of as-deposited Bi2Te3 and Sb2Te3 thin films were recorded using FESEM as shown in Figure 3A and Figure 3B, respectively. The surface of the overall film appears uniform and smooth. It is apparent that the crystal grains of the Bi2Te3 thin film were hexagonal, conforming the crystal structure of Bi2Te3 while the crystal grains of the Sb2...

The manuscript describes a protocol for radio frequency magnetron sputtering of Bi2Te3 and Sb2Te3 thermoelectric thin films on glass substrates, which represents a reliable deposition method that provides a wide range of applications with the potential for further development.

Through various studies on thermoelectric (TE) materials, thin film configuration gives superior advantages over conventional bulk TEs, including ...

fabrication-bi2te3-sb2te3-thermoelectric-thin-films-using-radio

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2.5K vistas.  Universiti Kebangsaan Malaysia. Nuestra investigación se centra en la fabricación de películas delgadas de alta calidad para generadores termoeléctricos con el fin de recuperar el calor residual y convertirlo en electricidad. Se han investigado y desarrollado varias técnicas de deposición de película delgada, incluida la pulverización catódica de magnetrón de radiofrecuencia que puede producir películas delgadas robustas y de alta densidad con mejor adhesión y alta uniformidad. Este método no requiere la fusió...

Video: Autor destacado: Avances en películas delgadas termoeléctricas de alto rendimiento a través de la pulverización catódica de magnetrón de radiofrecuencia