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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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12:05 min

February 21st, 2019

DOI :

10.3791/59017-v

February 21st, 2019


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U2O5

Rozdziały w tym wideo

0:04

Title

1:06

The Labstation Modular Machine

2:11

Introduction of the Sample and Sample Holder into the Labstation

3:10

Transfer the Sample Holder to the Preparation Chamber

4:03

In situ Cleaning of the Sample Holder and Sample Holder Characterization

5:39

Deposition of a UO2 Thin Film

6:50

UO2 Sample Characterization

7:38

Oxidation of UO2 with Atomic Oxygen and Analysis of the UO3 Obtained

8:52

Reduction of UO3 by Atomic Hydrogen and Analysis of the U2O5 Obtained

9:45

Results: Identification of Uranium(V) in Thin Films

10:51

Conclusion

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