JoVE Journal

Chemistry

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Fabricating Nanogaps by Nanoskiving

The fabrication of electrically addressable, high-aspect-ratio (> 1000:1) metal nanowires separated by gaps of single nanometers using either sacrificial layers of aluminum and silver or self-assembled monolayers as templates is described. These nanogap structures are fabricated without a clean room or any photo- or electron-beam lithographic processes by a form of edge lithography known as nanoskiving.

Capitoli in questo video

0:05

Title

1:13

Preparation of a Block for Sectioning: Self-assembled Monolayers

4:12

Sectioning to Produce Nanogap Structures

5:35

Preparation for Electrical Measurements of Self-assembled Monolayer Samples

6:00

Results: Images and Electrical Measurements for Nanogaps below 5 nm

7:15

Conclusion

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