JoVE Journal

Chemistry

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Fabricating Nanogaps by Nanoskiving

The fabrication of electrically addressable, high-aspect-ratio (> 1000:1) metal nanowires separated by gaps of single nanometers using either sacrificial layers of aluminum and silver or self-assembled monolayers as templates is described. These nanogap structures are fabricated without a clean room or any photo- or electron-beam lithographic processes by a form of edge lithography known as nanoskiving.

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Title

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Preparation of a Block for Sectioning: Self-assembled Monolayers

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Sectioning to Produce Nanogap Structures

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Preparation for Electrical Measurements of Self-assembled Monolayer Samples

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Results: Images and Electrical Measurements for Nanogaps below 5 nm

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Conclusion

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